Science and Technology of Thin films & Vacuum Detailed Syllabus for Nano Technology M.Tech first year second sem is covered here. This gives the details about credits, number of hours and other details along with reference books for the course.
The detailed syllabus for Science and Technology of Thin films & Vacuum M.Tech 2017-2018 (R17) first year second sem is as follows.
M.Tech. I Year II Sem.
Course Objective: The course covers the importance of thin film technology and nanofabrication, vacuum technology,
various physical and chemical methods of thin film a fabrication and various applications of thin films including sensors
Course Outcomes:
- Vacuum technology and principle of vacuum pumps- various types and ranges will be covered.
- Various fabrication methods of thin films will be dealt in detail
- Advantages, applications of thin films for devices also will be discussed
Prerequisite:
- Vacuum pump technology
- Basics of vacuum pump technology Perini and gauge technology
UNIT – I : Vacuum technology: principles of vacuum pumps in range of 10 -2 torr to 10-11 torr, principle of
different vacuum pumps: roots pump, rotary, diffusion, turbo molecular pump, cryogenic-pump, ion pump, Ti-sublimation pump, importance of measurement of Pressure, Concept of different gauges: Bayet- Albert gauge, Pirani, Penning and pressure control.
UNIT-II : Physical Vapor Depostion techniques: Thermal evaporation, resistive evaporation, e-beam evaporation, Electron beam evaporation, Laser ablation, Flash and Cathodic arc deposition, Electron beam, Ion beam lithography techniques and Pulsed LASER Deposition, Electrical discharges used in thin film deposition: Sputtering, Glow discharge sputtering, Magnetron sputtering, Ion beam sputtering, Ion plating, difference between thin films and coating.
UNIT–III : Electro deposition, molecular beam epitaxy and laser pyrolysis. Chemical vapor deposition techniques: Advantages and disadvantages of Chemical Vapor deposition (CVD) techniques over PVD techniques, reaction types, Boundaries, and flow, Different kinds of CVD techniques: Metallorganic CVD (MOCVD), Plasma Enhanced CVD (PECVD) Thermally activated CVD, CVD, Spray pyrolysis, etc.
UNIT – IV : Conditions for the formation of thin films: Environment for thin film deposition, deposition parameters
and their effects on film growth, formation of thin films (sticking coefficient, formation of thermodynamically stable cluster – theory of nucleation), capillarity theory, Growth modes: zone model for sputtering and evaporation, Island growth, Volmer weber, Layer growth, Van Vawler Megrue, S.K. (Stranski – Krans Favour) mode. Microstructure in thin films, adhesion,
UNIT – V : Properties of thin films: Mechanical, electrical, and optical properties of thin films, few applications of thin films in various fields. Application to Renewable energy technology – Thin film solar cells, Quantum well and Quantum dot solar cells, dye – sensitized solar cells.
REFERENCES:
- Materials Science of Thin Films: Milton Ohring.
- Thin Film Phenomenon by K. L. Chopra, McGraw-Hill
- Methods of Experimental Physics (Vol 14) by G. L. Weissler and R.W. Carlson “Vacuum Physics and Technology”
- A User’s Guide to vacuum Technology by J. F. O’Hanlon, John Wiley, and Sons
- Vacuum Physics and Techniques by T. A. Delchar, Chapman, and Hall
- Evaporation: Nucleation and Growth Kinetics” by J.P. Hirth and G. M. Pound, Pergamon Press
For all other M.Tech 1st Year 2nd Sem syllabus go to JNTUH M.Tech Nano Technology 1st Year 2nd Sem Course Structure for (R17) Batch.
All details and yearly new syllabus will be updated here time to time. Subscribe, like us on facebook and follow us on google plus for all updates.
Do share with friends and in case of questions please feel free drop a comment.