{"id":12405,"date":"2018-09-10T14:13:41","date_gmt":"2018-09-10T14:13:41","guid":{"rendered":"https:\/\/www.inspirenignite.com\/jntuh\/?p=12405"},"modified":"2026-05-24T10:28:27","modified_gmt":"2026-05-24T04:58:27","slug":"jntuh-m-tech-2017-2018-r17-detailed-syllabus-lithographic-techniques","status":"publish","type":"post","link":"https:\/\/www.inspirenignite.com\/jntuh\/jntuh-m-tech-2017-2018-r17-detailed-syllabus-lithographic-techniques\/","title":{"rendered":"JNTUH M.Tech 2017-2018 (R17) Detailed Syllabus Lithographic Techniques"},"content":{"rendered":"Lithographic Techniques Detailed Syllabus for Nano Technology M.Tech first year second sem is covered here. This gives the details about credits, number of hours and other details along with reference books for the course.\r\n\r\nThe detailed syllabus for Lithographic Techniques M.Tech 2017-2018 (R17) first year second sem is as follows.\r\n\r\nM.Tech. I Year II Sem.\r\n\r\n<strong>Course Objectives:<\/strong>\r\n<ul>\r\n \t<li>Able to define the concepts involved in physics and chemistry of surfaces along with the fundamental interactions amongst them.<\/li>\r\n \t<li>Understand the key concepts of lithographic and microscopic resolution and apply this knowledge to estimate the intrinsic resolution limits for manipulation and imaging\/inspection tools; Redefining the concepts of contrast and a transfer function for all systems and explain their role in both microscopy and lithography;<\/li>\r\n \t<li>Evolve how processing tools are applied to transfer nanostructured patterns into useful materials based on device architectures; analyze and evaluate proposed approaches to material processing to device designs in advance<\/li>\r\n<\/ul>\r\n<strong>Course Outcomes:\u00a0<\/strong>The ultimate aim is to study about nanostructures fabrication and processing in detail and to exercise\r\nthe learners\u2019 knowledge and imagination of nanoscience and nanotechnology toward engineering applications coupled with detailed justifications\r\n\r\n<strong>Prerequisite:<\/strong> Clean room technology, thin films coating techniques\r\n\r\n<strong>UNIT\u2013I: Introduction to lithography and Optical lithography:<\/strong> Introduction to lithography- Contact, proximity printing and Projection Printing, Resolution Enhancement techniques, overlay-accuracies, Mask-Error enhancement factor (MEEF), Positive and negative photoresists.\r\n\r\n<strong>UNIT\u2013II: Electron Lithography:<\/strong> Electron optics, Raster scan and Vector scan, Electron proximity \/ Projection Printing, Direct writing, Electron resists, Electron Beam Applications.\r\n\r\n<strong>UNIT\u2013III: X-ray Lithography:<\/strong> X-ray Proximity and projection printing X-ray masks, X-ray sources, X-ray resists.\r\n\r\n<strong>UNIT\u2013IV: Ion Lithography:<\/strong> Focussed ion beam \u2013 Point sources of Ion, Ion Column, Beam writing, Focused Ion Beam Lithography, Masked Ion Beam Lithography, Ion Projection Lithography.\r\n\r\n<strong>UNIT\u2013V: Lithography based on Surface Instabilities:<\/strong> Wetting, De-wetting, Adhesion, Limitations, Resolution and Achievable \/ line widths of each of the above techniques\r\n\r\n<strong>REFERENCE BOOKS:<\/strong>\r\n<ul>\r\n \t<li>K. L. Chopra, \u201cThin Film Phenomenon\u201d, McGraw-Hill, 1968<\/li>\r\n \t<li>John N. Helbert, \u201cHandbook of VLSI Microlithography\u201d, Noyes Publication, USA, 2001.<\/li>\r\n \t<li>James R Sheats and Bruce w. Smith, \u201cMicrolithography Science and Technology\u201d, Marcel Dekker Inc., New York, 1998.<\/li>\r\n \t<li>S. Wolf \u201cSilicon processing for the VLSI era\u201d, Vol-1 to 4, Lattice Press.<\/li>\r\n \t<li>J.P. Hirth and G.M. Pound \u201cEvaporation: Nucleation and Growth Kinetics\u201d (Pergamon Press, Oxford, 1963R. F. Bunshah and C. V. Deshpandey \u201cEvaporation Processes\u201d MRS Bulletin p. 33, Dec. 1988.<\/li>\r\n \t<li>W. D. Westwood \u201cSputter Deposition Processes\u201d MRS Bulletin p. 46, Dec. 1988.<\/li>\r\n \t<li>P. Harris \u201cTaking the Lead in Electron-beam Deposition\u201d Vacuum &amp; Thin Film, Feb. 1999, p. 26.<\/li>\r\n \t<li>B. Heinz Sputter Target and Thin Film Defects\u201d Vacuum &amp; Thin Film, October 1999, p. 22.<\/li>\r\n \t<li>G. S. Bales et al., \u201cGrowth and Erosion of Thin Splid Films\u201d, Science, 249, 264 (1990).<\/li>\r\n \t<li>C. R. M. Grovenor, H. T. G. Hentzell and D.A. Smith, \u201cThe Development of Grain Structure during Growth of Metallic Films\u201d Acta Metallurgica 32, 773 (1984).<\/li>\r\n \t<li>L. A. Stelmack, C. T. Thurman and G. R. Thompson \u201cReview of Ion-assisted Deposition:<\/li>\r\n \t<li>Research to Production\u201d, Nuclear Instruments and Methods in Physics Research B, 37\/38,787 (1989).<\/li>\r\n<\/ul>\r\nFor all other M.Tech 1st Year 2nd Sem syllabus go to <a href=\"https:\/\/www.inspirenignite.com\/jntuh\/jntuh-first-year-second-sem-nano-technology-for-m-tech-2017-2018-r17-batch\/\">JNTUH M.Tech Nano Technology 1st Year 2nd Sem Course Structure for (R17) Batch.<\/a>\r\n\r\nAll details and yearly new syllabus will be updated here time to time. Subscribe, like us on facebook and follow us on google plus for all updates.\r\n\r\nDo share with friends and in case of questions please feel free drop a comment.\n\n<h2>Download iStudy App (Android &amp; iOS)<\/h2>\n<div style=\"width: 100%;text-align: center;background: #f0f7ff;border: 1px solid #d9e8ff;border-radius: 10px;padding: 12px 10px;margin: 8px 0 12px 0\">\n<p style=\"margin: 0 0 8px 0\">Get instant JNTUH updates, timetables, results, and notices on mobile.<\/p>\n<div style=\"justify-content: center;align-items: flex-start;gap: 24px;flex-wrap: wrap\">\n<div style=\"flex-direction: column;align-items: center;gap: 2px\"><img decoding=\"async\" style=\"height: 54px;width: auto\" src=\"https:\/\/play.google.com\/intl\/en_us\/badges\/static\/images\/badges\/en_badge_web_generic.png\" alt=\"Get it on Google Play\" \/>\u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0\u00a0<img decoding=\"async\" style=\"height: 80px;width: 80px\" src=\"https:\/\/api.qrserver.com\/v1\/create-qr-code\/?size=120x120&amp;data=https:\/\/play.google.com\/store\/apps\/details?id=ini.istudy\" alt=\"Android app QR code\" \/><\/div>\n<div>\u00a0<\/div>\n<div style=\"flex-direction: column;align-items: center;gap: 2px\"><a href=\"https:\/\/play.google.com\/store\/apps\/details?id=ini.istudy\" target=\"_blank\" rel=\"noopener\">Android App<\/a><\/div>\n<div>\u00a0<\/div>\n<div style=\"flex-direction: column;align-items: center;gap: 2px\"><img decoding=\"async\" style=\"height: 40px;width: auto\" src=\"https:\/\/upload.wikimedia.org\/wikipedia\/commons\/3\/3c\/Download_on_the_App_Store_Badge.svg\" alt=\"Download on the App Store\" \/>\u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0 \u00a0\u00a0<img decoding=\"async\" style=\"height: 80px;width: 80px\" src=\"https:\/\/api.qrserver.com\/v1\/create-qr-code\/?size=120x120&amp;data=https:\/\/apps.apple.com\/us\/app\/istudy-app-syllabus-papers\/id6478500231\" alt=\"iOS app QR code\" \/><\/div>\n<div>\u00a0<\/div>\n<div style=\"flex-direction: column;align-items: center;gap: 2px\"><a href=\"https:\/\/apps.apple.com\/us\/app\/istudy-app-syllabus-papers\/id6478500231\" target=\"_blank\" rel=\"noopener\">iOS App <\/a><\/div>\n<\/div>\n<\/div>\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Lithographic Techniques Detailed Syllabus for Nano Technology M.Tech first year second sem is covered here. This gives the details about credits, number of hours and other details along with reference [&hellip;]<\/p>\n","protected":false},"author":2259,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_bbp_topic_count":0,"_bbp_reply_count":0,"_bbp_total_topic_count":0,"_bbp_total_reply_count":0,"_bbp_voice_count":0,"_bbp_anonymous_reply_count":0,"_bbp_topic_count_hidden":0,"_bbp_reply_count_hidden":0,"_bbp_forum_subforum_count":0,"footnotes":""},"categories":[73,62],"tags":[],"class_list":["post-12405","post","type-post","status-publish","format-standard","hentry","category-m-tech","category-syllabus"],"_links":{"self":[{"href":"https:\/\/www.inspirenignite.com\/jntuh\/wp-json\/wp\/v2\/posts\/12405","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.inspirenignite.com\/jntuh\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.inspirenignite.com\/jntuh\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.inspirenignite.com\/jntuh\/wp-json\/wp\/v2\/users\/2259"}],"replies":[{"embeddable":true,"href":"https:\/\/www.inspirenignite.com\/jntuh\/wp-json\/wp\/v2\/comments?post=12405"}],"version-history":[{"count":3,"href":"https:\/\/www.inspirenignite.com\/jntuh\/wp-json\/wp\/v2\/posts\/12405\/revisions"}],"predecessor-version":[{"id":39499,"href":"https:\/\/www.inspirenignite.com\/jntuh\/wp-json\/wp\/v2\/posts\/12405\/revisions\/39499"}],"wp:attachment":[{"href":"https:\/\/www.inspirenignite.com\/jntuh\/wp-json\/wp\/v2\/media?parent=12405"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.inspirenignite.com\/jntuh\/wp-json\/wp\/v2\/categories?post=12405"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.inspirenignite.com\/jntuh\/wp-json\/wp\/v2\/tags?post=12405"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}